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Novellus Sabre Extreme



SABRE.jpg


New at Semicon West, the Novellus Sabre Extreme electrofill system. One of the more interesting features isn't visible in the photo, though. The Viaform Extreme chemistry for filling high aspect ratio features in 45nm and 32nm technologies was developed in collaboration with ATMI/Enthone. Image courtesy of Novellus.


25 July 2006 12:50 PM | Comments (0) | TrackBack (0)

 


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